Toggle navigation
My submissions
Login
Toggle navigation
View item
imec Publications Repository
imec Publications
Conference contributions
View item
imec Publications Repository
imec Publications
Conference contributions
View item
JavaScript is disabled for your browser. Some features of this site may not work without it.
Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations
Metadata
Show full item record
Authors
Finders, Jo
;
Ronse, Kurt
;
Van den hove, Luc
;
Van Driessche, Veerle
;
Tzviatkov, Plamen
Conference
Proceedings Interface '97 Microlithography Symposium
Title
Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations
Publication type
Proceedings paper
Collections
Conference contributions
Search imec Publications Repository
This collection
Browse
All of imec Publications Repository
Collections
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
This collection
Publication date
Authors
Titles
Subjects
imec author
Availability
Publication type
My account
login