Publication:
Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations
Date
| dc.contributor.author | Finders, Jo | |
| dc.contributor.author | Ronse, Kurt | |
| dc.contributor.author | Van den hove, Luc | |
| dc.contributor.author | Van Driessche, Veerle | |
| dc.contributor.author | Tzviatkov, Plamen | |
| dc.contributor.imecauthor | Ronse, Kurt | |
| dc.contributor.imecauthor | Van den hove, Luc | |
| dc.contributor.imecauthor | Van Driessche, Veerle | |
| dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
| dc.date.accessioned | 2021-09-30T08:16:49Z | |
| dc.date.available | 2021-09-30T08:16:49Z | |
| dc.date.issued | 1997 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/1882 | |
| dc.source.beginpage | 17 | |
| dc.source.conference | Proceedings Interface '97 Microlithography Symposium | |
| dc.source.conferencelocation | ||
| dc.source.endpage | 30 | |
| dc.title | Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations | |
| dc.type | Proceedings paper | |
| dspace.entity.type | Publication | |
| Files | ||
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