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Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations
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Impact of SEM accuracy on the CD control during gate patterning process of 0.25μm and sub-0.25μm generations
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Date
1997
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Finders, Jo
;
Ronse, Kurt
;
Van den hove, Luc
;
Van Driessche, Veerle
;
Tzviatkov, Plamen
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1890
since deposited on 2021-09-30
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Acq. date: 2026-01-11
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Metrics
Views
1890
since deposited on 2021-09-30
3
last month
Acq. date: 2026-01-11
Citations