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Improvement of thermal stability in high density Ta2O5 3D capacitor by additional thin SiO2 layer

dc.contributor.authorDetalle, Mikael
dc.contributor.authorDekkers, Harold
dc.contributor.authorPotoms, Goedele
dc.contributor.authorPhommahaxay, Alain
dc.contributor.authorSabuncuoglu Tezcan, Deniz
dc.contributor.authorSoussan, Philippe
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-19T13:14:28Z
dc.date.available2021-10-19T13:14:28Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18833
dc.sourceIIOimport
dc.titleImprovement of thermal stability in high density Ta2O5 3D capacitor by additional thin SiO2 layer
dc.typeMeeting abstract
dc.contributor.imecauthorDetalle, Mikael
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorPotoms, Goedele
dc.contributor.imecauthorPhommahaxay, Alain
dc.contributor.imecauthorSabuncuoglu Tezcan, Deniz
dc.contributor.imecauthorSoussan, Philippe
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecSabuncuoglu Tezcan, Deniz::0000-0002-9237-7862
dc.contributor.orcidimecSoussan, Philippe::0000-0002-1347-6978
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Solid State Devices and Materials - SSDM
dc.source.conferencedate28/09/2011
dc.source.conferencelocationNagoya Japan
imec.availabilityPublished - imec


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