Understanding EUV resist dissolution characteristics and its impact to RLS limitations

Thumbnail
View/open
Metadata
Show full item record
Authors
Fonseca, Carlos; Head, Brian H.; Shite, Hideo; Nafus, Kathleen; Gronheid, Roel; Winroth, Gustaf
Conference
Extreme Ultraviolet (EUV) Lithography II
Title
Understanding EUV resist dissolution characteristics and its impact to RLS limitations
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections