Show simple item record

Understanding EUV resist dissolution characteristics and its impact to RLS limitations

dc.contributor.authorFonseca, Carlos
dc.contributor.authorHead, Brian H.
dc.contributor.authorShite, Hideo
dc.contributor.authorNafus, Kathleen
dc.contributor.authorGronheid, Roel
dc.contributor.authorWinroth, Gustaf
dc.date.accessioned2021-10-19T13:34:32Z
dc.date.available2021-10-19T13:34:32Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18919
dc.sourceIIOimport
dc.titleUnderstanding EUV resist dissolution characteristics and its impact to RLS limitations
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage796911
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol.7969


Files in this item

Thumbnail
Name:
22435.pdf
Size:
838.4Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record