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Impact of post-litho LWR smoothing processes on the post-etch patterning result

dc.contributor.authorFoubert, Philippe
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-19T13:35:00Z
dc.date.available2021-10-19T13:35:00Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18921
dc.sourceIIOimport
dc.titleImpact of post-litho LWR smoothing processes on the post-etch patterning result
dc.typeProceedings paper
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage797213
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVIII
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7972


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