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Demonstration of lithography patterns using reflective e-beam direct write

dc.contributor.authorFreed, Regina
dc.contributor.authorSun, Jeff
dc.contributor.authorBrodie, Alan D.
dc.contributor.authorPetric, Paul
dc.contributor.authorMcCord, Marc A.
dc.contributor.authorRonse, Kurt
dc.contributor.authorHaspeslagh, Luc
dc.contributor.authorVereecke, Bart
dc.date.accessioned2021-10-19T13:38:13Z
dc.date.available2021-10-19T13:38:13Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18933
dc.sourceIIOimport
dc.titleDemonstration of lithography patterns using reflective e-beam direct write
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorHaspeslagh, Luc
dc.contributor.imecauthorVereecke, Bart
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79701T
dc.source.conferenceAlternative Lithographic Technologies III
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7970


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