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EUV resist performance update on ADT and NXE:3100 scanner

dc.contributor.authorGoethals, Mieke
dc.contributor.authorNiroomand, Ardavan
dc.contributor.authorHosokawa, Kohei
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorPollentier, Ivan
dc.contributor.authorVan Den Heuvel, Dieter
dc.date.accessioned2021-10-19T13:47:31Z
dc.date.available2021-10-19T13:47:31Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/18968
dc.sourceIIOimport
dc.titleEUV resist performance update on ADT and NXE:3100 scanner
dc.typeProceedings paper
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate17/10/2011
dc.source.conferencelocationMiami, FL USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings on Sematech-website


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