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A study of electrically active defects created in p-InP by CH4:H2 reactive ion etching
Publication:
A study of electrically active defects created in p-InP by CH4:H2 reactive ion etching
Date
1997
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Goubert, L.
;
Van Meirhaeghe, R. L.
;
Clauws, P.
;
Cardon, F.
;
Van Daele, Peter
Journal
Journal of Applied Physics
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1932
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations
Metrics
Views
1932
since deposited on 2021-09-30
Acq. date: 2025-10-23
Citations