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On the breakdown statistics and mechanisms in ultra-thin oxides and nitrided oxides

dc.contributor.authorGroeseneken, Guido
dc.contributor.authorDegraeve, Robin
dc.contributor.authorDe Blauwe, Jan
dc.contributor.authorRoussel, Philippe
dc.contributor.authorDepas, Michel
dc.contributor.authorMaes, Herman
dc.date.accessioned2021-09-30T08:20:51Z
dc.date.available2021-09-30T08:20:51Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1903
dc.sourceIIOimport
dc.titleOn the breakdown statistics and mechanisms in ultra-thin oxides and nitrided oxides
dc.typeProceedings paper
dc.contributor.imecauthorGroeseneken, Guido
dc.contributor.imecauthorDegraeve, Robin
dc.contributor.imecauthorRoussel, Philippe
dc.contributor.orcidimecGroeseneken, Guido::0000-0003-3763-2098
dc.contributor.orcidimecRoussel, Philippe::0000-0002-0402-8225
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage3
dc.source.endpage19
dc.source.conferenceSilicon Nitride and Silicon Dioxide Thin Insulating Films
dc.source.conferencedate4/05/1997
dc.source.conferencelocationMontréal Canada
imec.availabilityPublished - imec
imec.internalnotesECS Proceedings; Vol. 97-10


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