Show simple item record

Increasing DOF for VIA lithography using a non-CMP based architecture

dc.contributor.authorGrozev, Grozdan
dc.contributor.authorWaeterloos, Joost
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.contributor.authorTzviatkov, Plamen
dc.date.accessioned2021-09-30T08:21:13Z
dc.date.available2021-09-30T08:21:13Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/1905
dc.sourceIIOimport
dc.titleIncreasing DOF for VIA lithography using a non-CMP based architecture
dc.typeProceedings paper
dc.contributor.imecauthorGrozev, Grozdan
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.source.peerreviewno
dc.source.beginpage249
dc.source.endpage257
dc.source.conferenceProceedings Interface '97 Microlithography Symposium;
dc.source.conferencelocation
imec.availabilityPublished - imec


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record