Verification and extension of the MBL technique for photoresist pattern shape measurement

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Authors
Isawa, Miki; Tanaka, Maki; Kazumi, Hideyuki; Shishido, Chie; Hamamatsu, Akira; Hasegawa, Norio; De Bisschop, Peter; Laidler, David; Leray, Philippe; Cheng, Shaunee
Conference
Metrology, Inspection, and Process Control XXV
Title
Verification and extension of the MBL technique for photoresist pattern shape measurement
Publication type
Proceedings paper
Embargo date
9999-12-31
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