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Verification and extension of the MBL technique for photoresist pattern shape measurement
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Verification and extension of the MBL technique for photoresist pattern shape measurement
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Date
2011
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Isawa, Miki
;
Tanaka, Maki
;
Kazumi, Hideyuki
;
Shishido, Chie
;
Hamamatsu, Akira
;
Hasegawa, Norio
;
De Bisschop, Peter
;
Laidler, David
;
Leray, Philippe
;
Cheng, Shaunee
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1953
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Acq. date: 2026-02-24
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Views
1953
since deposited on 2021-10-19
2
last month
1
last week
Acq. date: 2026-02-24
Citations