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Verification and extension of the MBL technique for photoresist pattern shape measurement

dc.contributor.authorIsawa, Miki
dc.contributor.authorTanaka, Maki
dc.contributor.authorKazumi, Hideyuki
dc.contributor.authorShishido, Chie
dc.contributor.authorHamamatsu, Akira
dc.contributor.authorHasegawa, Norio
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorLaidler, David
dc.contributor.authorLeray, Philippe
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-19T14:28:38Z
dc.date.available2021-10-19T14:28:38Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19108
dc.sourceIIOimport
dc.titleVerification and extension of the MBL technique for photoresist pattern shape measurement
dc.typeProceedings paper
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorLaidler, David
dc.contributor.imecauthorLeray, Philippe
dc.contributor.orcidimecLaidler, David::0000-0003-4055-3366
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79710Z
dc.source.conferenceMetrology, Inspection, and Process Control XXV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 7971


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