dc.contributor.author | Jonckheere, Rik | |
dc.contributor.author | Van Den Heuvel, Dieter | |
dc.contributor.author | Hendrickx, Eric | |
dc.contributor.author | Ronse, Kurt | |
dc.contributor.author | Bret, Tristan | |
dc.contributor.author | Hofmann, Thorsten | |
dc.contributor.author | Magana, John | |
dc.contributor.author | Aharonson, Israel | |
dc.contributor.author | Meshulach, Doron | |
dc.date.accessioned | 2021-10-19T14:37:57Z | |
dc.date.available | 2021-10-19T14:37:57Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/19138 | |
dc.source | IIOimport | |
dc.title | Evidence of printing blank-related defects on EUV masks missed by blank inspection | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Jonckheere, Rik | |
dc.contributor.imecauthor | Van Den Heuvel, Dieter | |
dc.contributor.imecauthor | Hendrickx, Eric | |
dc.contributor.imecauthor | Ronse, Kurt | |
dc.contributor.orcidimec | Jonckheere, Rik::0000-0003-2211-9443 | |
dc.contributor.orcidimec | Ronse, Kurt::0000-0003-0803-4267 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 79850W | |
dc.source.conference | 27th European Mask and Lithography Conference - EMLC | |
dc.source.conferencedate | 18/01/2011 | |
dc.source.conferencelocation | Dresden Germany | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings SPIE; vol.7985 | |