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Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry

dc.contributor.authorKesters, Els
dc.contributor.authorVereecke, Guy
dc.contributor.authorLux, Marcel
dc.contributor.authorPittevils, Joris
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-19T14:47:58Z
dc.date.available2021-10-19T14:47:58Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19169
dc.sourceIIOimport
dc.titleAqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry
dc.typeMeeting abstract
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorLux, Marcel
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.source.peerreviewno
dc.source.conference4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate5/05/2011
dc.source.conferencelocationMechelen Belgium
imec.availabilityPublished - imec


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