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Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry
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Authors
Kesters, Els
;
Vereecke, Guy
;
Lux, Marcel
;
Pittevils, Joris
;
Struyf, Herbert
Conference
4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM
Title
Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry
Publication type
Meeting abstract
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