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Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry
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Aqueous photoresist and BARC wet strip in BEOL MHM patterning using UV and ozonated chemistry
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Date
2011
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Kesters, Els
;
Vereecke, Guy
;
Lux, Marcel
;
Pittevils, Joris
;
Struyf, Herbert
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1958
since deposited on 2021-10-19
Acq. date: 2025-12-16
Citations
Metrics
Views
1958
since deposited on 2021-10-19
Acq. date: 2025-12-16
Citations