On the importance of source/drain series resistance in implant-free SiGe quantum well FETs

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Authors
Krom, Raymond; Hellings, Geert; Mitard, Jerome; Witters, Liesbeth; Hikavyy, Andriy; Eneman, Geert; Waldron, Niamh; Heyns, Marc; Hoffmann, Thomas Y.; De Meyer, Kristin
Conference
Silicon Nanoelectronics Workshop
Title
On the importance of source/drain series resistance in implant-free SiGe quantum well FETs
Publication type
Proceedings paper
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