Publication:
Narrow pitch dual damascene patterning using EUV lithography in association with a spin-on trilayer resist system
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1928 since deposited on 2021-10-19
10last month
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Acq. date: 2026-10-12
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Statistics
Views
1928 since deposited on 2021-10-19
10last month
6last week
Acq. date: 2026-10-12
Citations