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Narrow pitch dual damascene patterning using EUV lithography in association with a spin-on trilayer resist system
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Authors
Lazzarino, Frederic
;
Truffert, Vincent
;
Vereecke, Bart
;
Demuynck, Steven
Conference
AVS 58th Annual International Symposium and Exhibition
Title
Narrow pitch dual damascene patterning using EUV lithography in association with a spin-on trilayer resist system
Publication type
Meeting abstract
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