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Characterization of EUV resists for defectivity at 32nm

dc.contributor.authorMontal, Ofir
dc.contributor.authorDolev, Ido
dc.contributor.authorRosenzweig, Moshe
dc.contributor.authorDotan, Kfir
dc.contributor.authorMeshulach, Doron
dc.contributor.authorAdan, Ofer
dc.contributor.authorLevi, Shimon
dc.contributor.authorCai, Man-Ping
dc.contributor.authorBencher, Chris
dc.contributor.authorNgai, Christopher S.
dc.contributor.authorJehoul, Christiane
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorHendrickx, Eric
dc.date.accessioned2021-10-19T16:30:02Z
dc.date.available2021-10-19T16:30:02Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19451
dc.sourceIIOimport
dc.titleCharacterization of EUV resists for defectivity at 32nm
dc.typeProceedings paper
dc.contributor.imecauthorJehoul, Christiane
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.orcidimecHendrickx, Eric::0000-0003-2516-0417
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79710G
dc.source.conferenceMetrology, Inspection, and Process Control XXV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan José (CA) USA
imec.availabilityPublished - imec
imec.internalnotesProceedings SPIE, Vol. 7971


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