In-Situ HCl etching of InP in shallow-trench-isolated structures

Thumbnail
View/open
Metadata
Show full item record
Authors
Orzali, Tommaso; Wang, G.; Waldron, Niamh; Merckling, Clement; Richard, Olivier; Bender, Hugo; Caymax, Matty
Conference
220th ECS Fall Meeting
Title
In-Situ HCl etching of InP in shallow-trench-isolated structures
Publication type
Meeting abstract
Embargo date
9999-12-31
Collections