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dc.contributor.authorPacco, Antoine
dc.contributor.authorSebaai, Farid
dc.contributor.authorSuhard, Samuel
dc.contributor.authorStruyf, Herbert
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorVos, Rita
dc.contributor.authorVeloso, Anabela
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-19T17:01:46Z
dc.date.available2021-10-19T17:01:46Z
dc.date.issued2011-10
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19530
dc.sourceIIOimport
dc.titleGalvanic corrosion of PN junctions during the dielectric removal with HF for RMG transistors
dc.typeProceedings paper
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVos, Rita
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage37
dc.source.endpage43
dc.source.conferenceSemiconductor Cleaning Science and Technology 12
dc.source.conferencedate9/10/2011
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 41, Issue 5


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