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Unraveling the effect of resist composition on EUV optics contamination

dc.contributor.authorPollentier, Ivan
dc.contributor.authorNeira, Imanol
dc.contributor.authorGoethals, Mieke
dc.contributor.authorGronheid, Roel
dc.contributor.authorTarutani, S.
dc.contributor.authorTamaoki, H.
dc.contributor.authorTakahashi, T.
dc.contributor.authorTsubaki, H.
dc.date.accessioned2021-10-19T17:25:20Z
dc.date.available2021-10-19T17:25:20Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19587
dc.sourceIIOimport
dc.titleUnraveling the effect of resist composition on EUV optics contamination
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorGronheid, Roel
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79692L
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7969


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