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Ultra clean processing technologies: advanced si-surface preparation techniques

dc.contributor.authorHeyns, Marc
dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorHurd, Trace
dc.contributor.authorSchmidt, Harald
dc.contributor.authorVerhaverbeke, Steven
dc.contributor.authorHatcher, Z.
dc.contributor.authorGräf, D.
dc.date.accessioned2021-09-29T12:42:09Z
dc.date.available2021-09-29T12:42:09Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/195
dc.sourceIIOimport
dc.titleUltra clean processing technologies: advanced si-surface preparation techniques
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceTechnical Conference SEMICON / Europe
dc.source.conferencedate12/04/1994
dc.source.conferencelocationGenève Switzerland
imec.availabilityPublished - open access
imec.internalnotesunpaged


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