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On the origin of mobility reduction in ultrathin EOT HK/MG CMOS devices: Impact from gate-stack and device architecture
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Authors
Ragnarsson, Lars-Ake
;
Mitard, Jerome
;
Hong, Sug-Hun
;
Takeoka, Shinji
;
Tseng, Joshua
;
Wang, Wei-E
;
Yamaguchi, Shinpei
;
Trojman, Lionel
;
Kauerauf, Thomas
;
De Keersgieter, An
;
Schram, Tom
;
Rohr, Erika
;
Collaert, Nadine
;
Jurczak, Gosia
;
Bourdelle, Konstantin
;
Nguyen, B-Y
;
Absil, Philippe
;
Hoffmann, Thomas Y.
Conference
International Workshop on Dielectric Thin Films for Future Electron Devices: Science and Technology - IWDTF-11
Title
On the origin of mobility reduction in ultrathin EOT HK/MG CMOS devices: Impact from gate-stack and device architecture
Publication type
Proceedings paper
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