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Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques

dc.contributor.authorRedolfi, Augusto
dc.contributor.authorSleeckx, Erik
dc.contributor.authorDevriendt, Katia
dc.contributor.authorShamiryan, Denis
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorTogo, Mitsuhiro
dc.contributor.authorWouters, Johan M. D.
dc.contributor.authorJurczak, Gosia
dc.contributor.authorHoffmann, Thomas Y.
dc.contributor.authorCockburn, Andrew
dc.contributor.authorGravey, Virginie
dc.contributor.authorDiehl, D.L.
dc.date.accessioned2021-10-19T18:02:45Z
dc.date.available2021-10-19T18:02:45Z
dc.date.issued2011-03
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19676
dc.sourceIIOimport
dc.titleBulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
dc.typeProceedings paper
dc.contributor.imecauthorRedolfi, Augusto
dc.contributor.imecauthorSleeckx, Erik
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorWouters, Johan M. D.
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorCockburn, Andrew
dc.contributor.orcidimecSleeckx, Erik::0000-0003-2560-6132
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage31
dc.source.endpage33
dc.source.conference12th International Conference on Ultimate Integration on Silicon - ULIS
dc.source.conferencedate14/03/2011
dc.source.conferencelocationCork Ireland
dc.identifier.urlhttp://tyndall.emakina-eu.net/projects/home/1120
imec.availabilityPublished - open access


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