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ALD Ru and its applications in DRAM MIM-capacitors and interconnect

dc.contributor.authorSchaekers, Marc
dc.contributor.authorSwerts, Johan
dc.contributor.authorAltimime, Laith
dc.contributor.authorTokei, Zsolt
dc.date.accessioned2021-10-19T18:30:58Z
dc.date.available2021-10-19T18:30:58Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19740
dc.sourceIIOimport
dc.titleALD Ru and its applications in DRAM MIM-capacitors and interconnect
dc.typeProceedings paper
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage509
dc.source.endpage514
dc.source.conferenceChina Semiconductor Technology International Conference - CSTIC
dc.source.conferencedate13/03/2011
dc.source.conferencelocationShanghai China
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 34, Issue 1


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