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Ultra clean processing technology for highly reliable gate oxides

dc.contributor.authorHeyns, Marc
dc.contributor.authorMeuris, Marc
dc.contributor.authorMertens, Paul
dc.contributor.authorSchmidt, Harald
dc.contributor.authorVerhaverbeke, Steven
dc.contributor.authorBender, Hugo
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.contributor.authorRotondaro, Antonio
dc.contributor.authorHatcher, Z.
dc.contributor.authorGräf, D.
dc.date.accessioned2021-09-29T12:42:12Z
dc.date.available2021-09-29T12:42:12Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/197
dc.sourceIIOimport
dc.titleUltra clean processing technology for highly reliable gate oxides
dc.typeProceedings paper
dc.contributor.imecauthorHeyns, Marc
dc.contributor.imecauthorMeuris, Marc
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorBender, Hugo
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecMeuris, Marc::0000-0002-9580-6810
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage200
dc.source.endpage209
dc.source.conferenceProceedings of the Institute of Environmental Science: 40th Annual Technical Meeting
dc.source.conferencedate01/05/1994
dc.source.conferencelocationChicago, IL USA
imec.availabilityPublished - open access


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