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S-passivation of the Ge gate stack: Tuning the gate stack properties by changing the atomic layer deposition oxidant precursor
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2043 since deposited on 2021-10-19
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Acq. date: 2025-10-25
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Views
2043 since deposited on 2021-10-19
440item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations