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S-passivation of the Ge gate stack: Tuning the gate stack properties by changing the atomic layer deposition oxidant precursor
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2047 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-11
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Views
2047 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-11
Citations