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Plasma-induced damage reduction in porous SiOCH dielectrics by replacement of H2 and N2 by CH2F2 and Ar in fluorocarbon based plasmas
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1888 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-16
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Metrics
Views
1888 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-16
Citations