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Plasma-induced damage reduction in porous SiOCH dielectrics by replacement of H2 and N2 by CH2F2 and Ar in fluorocarbon based plasmas
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Authors
Souriau, Laurent
;
Lazzarino, Frederic
;
Carbonell, Laure
;
Ciofi, Ivan
;
Verdonck, Patrick
;
de Marneffe, Jean-Francois
;
Baklanov, Mikhaïl
Conference
AVS 58th International Symposium and Exhibition
Title
Plasma-induced damage reduction in porous SiOCH dielectrics by replacement of H2 and N2 by CH2F2 and Ar in fluorocarbon based plasmas
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Meeting abstract
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