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Plasma-induced damage reduction in porous SiOCH dielectrics by replacement of H2 and N2 by CH2F2 and Ar in fluorocarbon based plasmas

dc.contributor.authorSouriau, Laurent
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorCarbonell, Laure
dc.contributor.authorCiofi, Ivan
dc.contributor.authorVerdonck, Patrick
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-19T19:05:44Z
dc.date.available2021-10-19T19:05:44Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19815
dc.sourceIIOimport
dc.titlePlasma-induced damage reduction in porous SiOCH dielectrics by replacement of H2 and N2 by CH2F2 and Ar in fluorocarbon based plasmas
dc.typeMeeting abstract
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorCiofi, Ivan
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecCiofi, Ivan::0000-0003-1374-4116
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.source.peerreviewno
dc.source.conferenceAVS 58th International Symposium and Exhibition
dc.source.conferencedate30/10/2011
dc.source.conferencelocationNashville, TN USA
imec.availabilityPublished - imec


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