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Development of a wet silicon removal process for replacement metal gate and sacrificial fin

dc.contributor.authorSuhard, Samuel
dc.contributor.authorSebaai, Farid
dc.contributor.authorPacco, Antoine
dc.contributor.authorVeloso, Anabela
dc.contributor.authorCarbonell, Laure
dc.contributor.authorClaes, Martine
dc.contributor.authorStruyf, Herbert
dc.contributor.authorMertens, Paul
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-19T19:22:25Z
dc.date.available2021-10-19T19:22:25Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19850
dc.sourceIIOimport
dc.titleDevelopment of a wet silicon removal process for replacement metal gate and sacrificial fin
dc.typeMeeting abstract
dc.contributor.imecauthorSuhard, Samuel
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorPacco, Antoine
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewno
dc.source.beginpage2054
dc.source.conferenceElectrochemical Society Fall Meeting Symposium E7 - Semiconductor Cleaning Science and Technology 12 - SCST 12
dc.source.conferencedate10/10/2011
dc.source.conferencelocationBoston, MA USA
imec.availabilityPublished - imec
imec.internalnotesECS Meeting Abstracts; Vol. MA1102


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