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Simulating plasma + surface processes for the etching of silicon wtih an Ar/Cl2/O2 inductively coupled plasma
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1848 since deposited on 2021-10-19
3last month
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Acq. date: 2026-05-01
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Statistics
Views
1848 since deposited on 2021-10-19
3last month
2last week
Acq. date: 2026-05-01
Citations