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Simulating plasma + surface processes for the etching of silicon wtih an Ar/Cl2/O2 inductively coupled plasma
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1844 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-11
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Views
1844 since deposited on 2021-10-19
1last month
Acq. date: 2025-12-11
Citations