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Process development of ALD-rutile-TiO2/Ru(Ox) for DRAM MIMcap application and its leakage mechanism analysis

dc.contributor.authorTomida, Kazuyuki
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorSwerts, Johan
dc.contributor.authorWang, Mugwort
dc.contributor.authorKaczer, Ben
dc.contributor.authorPawlak, Malgorzata
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorKim, Min-Soo
dc.contributor.authorDebusschere, Ingrid
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorAltimime, Laith
dc.contributor.authorKittl, Jorge
dc.date.accessioned2021-10-19T19:46:13Z
dc.date.available2021-10-19T19:46:13Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19901
dc.sourceIIOimport
dc.titleProcess development of ALD-rutile-TiO2/Ru(Ox) for DRAM MIMcap application and its leakage mechanism analysis
dc.typeProceedings paper
dc.contributor.imecauthorTomida, Kazuyuki
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorKaczer, Ben
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorKim, Min-Soo
dc.contributor.imecauthorDebusschere, Ingrid
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.orcidimecKaczer, Ben::0000-0002-1484-4007
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecKim, Min-Soo::0000-0003-0211-0847
dc.source.peerreviewyes
dc.source.beginpage969
dc.source.endpage970
dc.source.conferenceInternational Conference on Solid-State Devices and Materials - SSDM
dc.source.conferencedate28/09/2011
dc.source.conferencelocationNagoya Japan
imec.availabilityPublished - imec


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