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Dry etch challenges for implantable silicon-based semi-flexible neural probe fabrication

dc.contributor.authorTutunjyan, Nina
dc.contributor.authorAndrei, Alexandru
dc.contributor.authorVerbinnen, Greet
dc.contributor.authorSlabbekoorn, John
dc.contributor.authorEberle, Wolfgang
dc.contributor.authorBaier, Ulrich
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-19T19:57:49Z
dc.date.available2021-10-19T19:57:49Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19924
dc.sourceIIOimport
dc.titleDry etch challenges for implantable silicon-based semi-flexible neural probe fabrication
dc.typeOral presentation
dc.contributor.imecauthorTutunjyan, Nina
dc.contributor.imecauthorAndrei, Alexandru
dc.contributor.imecauthorVerbinnen, Greet
dc.contributor.imecauthorSlabbekoorn, John
dc.contributor.imecauthorEberle, Wolfgang
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecEberle, Wolfgang::0000-0002-6115-9811
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewno
dc.source.conference4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate5/05/2011
dc.source.conferencelocationMechelen Belgium
dc.identifier.urlwww.pesm2011.be
imec.availabilityPublished - imec


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