Impact of mask line roughness in EUV lithography

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Authors
Vaglio Pret, Alessandro; Gronheid, Roel; Graves, Trey; Smith, Mark D.; Biafore, John
Conference
Extreme Ultraviolet (EUV) Lithography II
Title
Impact of mask line roughness in EUV lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
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