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Impact of mask line roughness in EUV lithography
Publication:
Impact of mask line roughness in EUV lithography
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Date
2011
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vaglio Pret, Alessandro
;
Gronheid, Roel
;
Graves, Trey
;
Smith, Mark D.
;
Biafore, John
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Acq. date: 2025-12-12
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1906
since deposited on 2021-10-19
2
last month
Acq. date: 2025-12-12
Citations