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Impact of mask line roughness in EUV lithography

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorGraves, Trey
dc.contributor.authorSmith, Mark D.
dc.contributor.authorBiafore, John
dc.date.accessioned2021-10-19T20:02:13Z
dc.date.available2021-10-19T20:02:13Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19933
dc.sourceIIOimport
dc.titleImpact of mask line roughness in EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79691T
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceeding SPIE; Vol. 7969


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