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Optical proximity stability control of ArF immersion clusters

dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.contributor.authorD'have, Koen
dc.contributor.authorLaenens, Bart
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorCheng, Shaunee
dc.contributor.authorSchreel, Koen
dc.contributor.authorGemmink, Jan-Willem
dc.date.accessioned2021-10-19T20:26:41Z
dc.date.available2021-10-19T20:26:41Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/19985
dc.sourceIIOimport
dc.titleOptical proximity stability control of ArF immersion clusters
dc.typeProceedings paper
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorD'have, Koen
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79731I
dc.source.conferenceOptical Microlithography XXIV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7973


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