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Patterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithography

dc.contributor.authorVandeweyer, Tom
dc.contributor.authorDe Backer, Johan
dc.contributor.authorVersluijs, Janko
dc.contributor.authorTruffert, Vincent
dc.contributor.authorVerhaegen, Staf
dc.contributor.authorErcken, Monique
dc.contributor.authorDusa, Mircea
dc.date.accessioned2021-10-19T20:44:53Z
dc.date.available2021-10-19T20:44:53Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20024
dc.sourceIIOimport
dc.titlePatterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithography
dc.typeProceedings paper
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorDe Backer, Johan
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorDusa, Mircea
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79691K
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography II
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings SPIE; Vol. 7696


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