dc.contributor.author | Vandeweyer, Tom | |
dc.contributor.author | De Backer, Johan | |
dc.contributor.author | Versluijs, Janko | |
dc.contributor.author | Truffert, Vincent | |
dc.contributor.author | Verhaegen, Staf | |
dc.contributor.author | Ercken, Monique | |
dc.contributor.author | Dusa, Mircea | |
dc.date.accessioned | 2021-10-19T20:44:53Z | |
dc.date.available | 2021-10-19T20:44:53Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20024 | |
dc.source | IIOimport | |
dc.title | Patterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithography | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Vandeweyer, Tom | |
dc.contributor.imecauthor | De Backer, Johan | |
dc.contributor.imecauthor | Versluijs, Janko | |
dc.contributor.imecauthor | Truffert, Vincent | |
dc.contributor.imecauthor | Ercken, Monique | |
dc.contributor.imecauthor | Dusa, Mircea | |
dc.contributor.orcidimec | Truffert, Vincent::0000-0001-7851-830X | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 79691K | |
dc.source.conference | Extreme Ultraviolet (EUV) Lithography II | |
dc.source.conferencedate | 27/02/2011 | |
dc.source.conferencelocation | San Jose, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings SPIE; Vol. 7696 | |