Publication:
Multi-gate fin field-effect transistors junctions optimization by conventional ion implantation for (Sub-)22 nm technology nodes circuit applications
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1835 since deposited on 2021-10-19
2last month
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Acq. date: 2025-12-18
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Views
1835 since deposited on 2021-10-19
2last month
1last week
Acq. date: 2025-12-18
Citations