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Fundamental study of atomic layer deposition in and on porous low-k films

dc.contributor.authorVerdonck, Patrick
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSwerts, Johan
dc.contributor.authorFarrell, L
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorTielens, Hilde
dc.contributor.authorVan Besien, Els
dc.contributor.authorWitters, J.
dc.contributor.authorNyns, Laura
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-19T20:58:02Z
dc.date.available2021-10-19T20:58:02Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20051
dc.sourceIIOimport
dc.titleFundamental study of atomic layer deposition in and on porous low-k films
dc.typeProceedings paper
dc.contributor.imecauthorVerdonck, Patrick
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorTielens, Hilde
dc.contributor.imecauthorVan Besien, Els
dc.contributor.imecauthorNyns, Laura
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecVerdonck, Patrick::0000-0003-2454-0602
dc.contributor.orcidimecVan Besien, Els::0000-0002-5174-2229
dc.contributor.orcidimecNyns, Laura::0000-0001-8220-870X
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpageP1.10
dc.source.conferenceIEEE International Interconnect Technology Conference and Materials for Advanced Metallization - IITC/MAM
dc.source.conferencedate8/05/2011
dc.source.conferencelocationDresden Germany
imec.availabilityPublished - imec


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