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Characterization of modification of 193-nm photoresist by HBr plasma

dc.contributor.authorVereecke, Guy
dc.contributor.authorClaes, Martine
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorStruyf, Herbert
dc.contributor.authorCarleer, Robert
dc.contributor.authorAdriaensens, Peter
dc.date.accessioned2021-10-19T21:00:40Z
dc.date.available2021-10-19T21:00:40Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20056
dc.sourceIIOimport
dc.titleCharacterization of modification of 193-nm photoresist by HBr plasma
dc.typeMeeting abstract
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorClaes, Martine
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.imecauthorAdriaensens, Peter
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.source.peerreviewyes
dc.source.conference4th International Workshop on Plasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate5/05/2011
dc.source.conferencelocationMechelen Belgium
dc.identifier.urlhttp://www.pesm2011.be/Pesm2011/Program_Friday.html
imec.availabilityPublished - imec


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