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Spacer defined double patterning for (sub-)20nm half pitch single damascene structures

dc.contributor.authorVersluijs, Janko
dc.contributor.authorSiew, Yong Kong
dc.contributor.authorKunnen, Eddy
dc.contributor.authorVangoidsenhoven, Diziana
dc.contributor.authorDemuynck, Steven
dc.contributor.authorWiaux, Vincent
dc.contributor.authorDekkers, Harold
dc.contributor.authorBeyer, Gerald
dc.date.accessioned2021-10-19T21:15:52Z
dc.date.available2021-10-19T21:15:52Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20086
dc.sourceIIOimport
dc.titleSpacer defined double patterning for (sub-)20nm half pitch single damascene structures
dc.typeProceedings paper
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorSiew, Yong Kong
dc.contributor.imecauthorVangoidsenhoven, Diziana
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecWiaux, Vincent::0000-0002-8923-5708
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage79731R
dc.source.conferenceOptical Microlithography XXIV
dc.source.conferencedate27/02/2011
dc.source.conferencelocationSan José (CA) USA
imec.availabilityPublished - imec
imec.internalnotesProceedings SPIE; Vol. 7973


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