TiSi2 and CoSi2: relevant materials issues for deep sub-micron technologies
dc.contributor.author | Maex, Karen | |
dc.contributor.author | Howard, Dave | |
dc.contributor.author | De Wolf, Ingrid | |
dc.contributor.author | Steegen, An | |
dc.date.accessioned | 2021-09-30T09:17:33Z | |
dc.date.available | 2021-09-30T09:17:33Z | |
dc.date.issued | 1997 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2008 | |
dc.source | IIOimport | |
dc.title | TiSi2 and CoSi2: relevant materials issues for deep sub-micron technologies | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.imecauthor | De Wolf, Ingrid | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 72 | |
dc.source.conference | Abstracts of the 4th International Workshop on Stress Induced Phenomena in Metallization | |
dc.source.conferencedate | 4/06/1997 | |
dc.source.conferencelocation | Tokyo Japan | |
imec.availability | Published - open access |