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Biaxial and uniaxial compressive stress implemanted in Ge(Sn) pMOSFET channels by advanced reduced pressure chemical vapor deposition developments
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1925 since deposited on 2021-10-19
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Acq. date: 2025-10-25
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Views
1925 since deposited on 2021-10-19
423item.page.metrics.field.last-week
Acq. date: 2025-10-25
Citations