Publication:
Biaxial and uniaxial compressive stress implemanted in Ge(Sn) pMOSFET channels by advanced reduced pressure chemical vapor deposition developments
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1968 since deposited on 2021-10-19
3last month
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Acq. date: 2026-08-08
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Statistics
Views
1968 since deposited on 2021-10-19
3last month
1last week
Acq. date: 2026-08-08
Citations