dc.contributor.author | Wang, Xin Peng | |
dc.contributor.author | Wouters, Dirk | |
dc.contributor.author | Toeller, Michael | |
dc.contributor.author | Meersschaut, Johan | |
dc.contributor.author | Goux, Ludovic | |
dc.contributor.author | Chen, Yangyin | |
dc.contributor.author | Govoreanu, Bogdan | |
dc.contributor.author | Pantisano, Luigi | |
dc.contributor.author | Degraeve, Robin | |
dc.contributor.author | Jurczak, Gosia | |
dc.contributor.author | Altimime, Laith | |
dc.contributor.author | Kittl, Jorge | |
dc.date.accessioned | 2021-10-19T21:42:36Z | |
dc.date.available | 2021-10-19T21:42:36Z | |
dc.date.issued | 2011 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/20136 | |
dc.source | IIOimport | |
dc.title | Influence of process parameters on low current resistive switching in MOCVD and ALD NiO Films | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Meersschaut, Johan | |
dc.contributor.imecauthor | Goux, Ludovic | |
dc.contributor.imecauthor | Chen, Yangyin | |
dc.contributor.imecauthor | Govoreanu, Bogdan | |
dc.contributor.imecauthor | Degraeve, Robin | |
dc.contributor.imecauthor | Jurczak, Gosia | |
dc.contributor.orcidimec | Meersschaut, Johan::0000-0003-2467-1784 | |
dc.contributor.orcidimec | Goux, Ludovic::0000-0002-1276-2278 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 1337-q07-09 | |
dc.source.conference | New Functional Materials and Emerging Device Architectures for Nonvolatile Memories | |
dc.source.conferencedate | 25/04/2011 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | MRS Symposium Proceedings; Vol. 1337 | |