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Process optimization enabled by novel quantitative pattern collapse metrology

dc.contributor.authorWinroth, Gustaf
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-19T21:50:36Z
dc.date.available2021-10-19T21:50:36Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20152
dc.sourceIIOimport
dc.titleProcess optimization enabled by novel quantitative pattern collapse metrology
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Lithography Extensions
dc.source.conferencedate20/10/2011
dc.source.conferencelocationMiami, FL USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings Sematech-website


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