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Investigation of litho1-litho2 proximity differences for a LPLE double patterning process

dc.contributor.authorWong, Patrick
dc.contributor.authorDe Bisschop, Peter
dc.contributor.authorRobertson, Stewart
dc.contributor.authorVandenbroeck, Nadia
dc.contributor.authorBiafore, John
dc.contributor.authorWiaux, Vincent
dc.contributor.authorVan de Kerkhove, Jeroen
dc.date.accessioned2021-10-19T21:53:28Z
dc.date.available2021-10-19T21:53:28Z
dc.date.issued2011
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/20157
dc.sourceIIOimport
dc.titleInvestigation of litho1-litho2 proximity differences for a LPLE double patterning process
dc.typeProceedings paper
dc.contributor.imecauthorWong, Patrick
dc.contributor.imecauthorDe Bisschop, Peter
dc.contributor.imecauthorVandenbroeck, Nadia
dc.contributor.imecauthorWiaux, Vincent
dc.contributor.imecauthorVan de Kerkhove, Jeroen
dc.contributor.orcidimecWong, Patrick::0000-0003-3605-9680
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Symposium on Lithography Extensions - EUVL
dc.source.conferencedate20/10/2011
dc.source.conferencelocationMiami (FL) USA
imec.availabilityPublished - open access
imec.internalnotese-proceedings on Sematech website


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